You know that the Tri-Gate transistor(now known as FinFET) introduced with 22nm Intel process pretty much achieves all that right? Even the FDSOI effect. The High-K dielectric mentioned above to reduce gate leakage was addressed in 2007 with 45nm!
The so-called Terahertz transistor was just a stepping stone on the way to commercialize the real thing, which was the Tri-Gate transistor.